Bias- and Temperature-Dependent Noise Measurements to Investigate Carrier Transport at the Tellurium Interface (POSTECH)

Press/Media

Period	2026.03.20

Media coverage

Title	Bias- and Temperature-Dependent Noise Measurements to Investigate Carrier Transport at the Tellurium Interface (POSTECH)
Media name/outlet	Semiconductor Engineering
Country/Territory	United States
Date	26.03.20
URL	ct.moreover.com/?a=59139722607&p=1gw&v=1&x=3PDplXqAuPQM5ZeIFB-5Fw
Persons	Min Jae Kim