New Findings from Seoul National University in the Area of Atomic Layer Deposition Described (Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer ...)

Media coverage

• Title	New Findings from Seoul National University in the Area of Atomic Layer Deposition Described (Comparative analysis of ferroelectric domain wall motion under cycling stress of HfZrO2 fabricated by thermal and plasma-enhanced atomic layer ...)
  Media name/outlet	South Korea Daily Report
  Country/Territory	United States
  Date	25.08.20
  Persons	Min-Ho Lee, Min Ro Lee