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A 50-110 GHz ohmic contact RF MEMS silicon switch with high isolation

  • Yong Seok Lee
  • , Yun Ho Jang
  • , Jung Mu Kim
  • , Yong Kweon Kim*
  • *Corresponding author for this work
  • Seoul National University

Research output: Contribution to conferenceConference paperpeer-review

Abstract

This paper presents the new concept of RF MEMS silicon contact switch and its verification for high isolation at 50-110 GHz. A high isolation is achieved by locating the floating top contact electrode 30 μm apart from the bottom coplanar waveguide (CPW) signal line in lateral direction at initial off-state. The switch contact is realized by the dual axis movement, namely a lateral movement by comb electrodes and a following vertical movement by a bottom electrode. The actuation voltages are measured for dual axis movement. The isolation of the switch was measured at 50-110 GHz to prove the concept of isolation improvement using dual axis movement.

Original languageEnglish
Title of host publicationMEMS 2010 - The 23rd IEEE International Conference on Micro Electro Mechanical Systems, Technical Digest
Pages759-762
Number of pages4
DOIs
StatePublished - 2010
Event23rd IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2010 - Hong Kong, China
Duration: 2010.01.242010.01.28

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Conference

Conference23rd IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2010
Country/TerritoryChina
CityHong Kong
Period10.01.2410.01.28

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Engineering - Mechanical
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Physics & Astronomy

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