A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song; Tsukasa Takahashi; Sejung Kim; Yvonne C. Heaney; John Warner; Shaochen Chen; Michael J. Heller

doi:10.1021/acsami.6b11361

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song
, Tsukasa Takahashi
, Sejung Kim
, Yvonne C. Heaney
, John Warner
, Shaochen Chen
, Michael J. Heller

Division of Chemical Engineering

University of California at San Diego

Research output: Contribution to journal › Journal article › peer-review

16 Scopus citations

Abstract

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

Original language	English
Pages (from-to)	22-28
Number of pages	7
Journal	ACS Applied Materials and Interfaces
Volume	9
Issue number	1
DOIs	https://doi.org/10.1021/acsami.6b11361
State	Published - 2017.01.11

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This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

displacer effect
DNA
patterning
photolithography
self-assembly
thymine dimer

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10.1021/acsami.6b11361

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title = "A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication",

abstract = "We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.",

keywords = "displacer effect, DNA, patterning, photolithography, self-assembly, thymine dimer",

author = "Youngjun Song and Tsukasa Takahashi and Sejung Kim and Heaney, \{Yvonne C.\} and John Warner and Shaochen Chen and Heller, \{Michael J.\}",

year = "2017",

month = jan,

day = "11",

doi = "10.1021/acsami.6b11361",

language = "English",

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T1 - A Programmable DNA Double-Write Material

T2 - Synergy of Photolithography and Self-Assembly Nanofabrication

AU - Song, Youngjun

AU - Takahashi, Tsukasa

AU - Kim, Sejung

AU - Heaney, Yvonne C.

AU - Warner, John

AU - Chen, Shaochen

AU - Heller, Michael J.

PY - 2017/1/11

Y1 - 2017/1/11

N2 - We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

AB - We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

KW - displacer effect

KW - DNA

KW - patterning

KW - photolithography

KW - self-assembly

KW - thymine dimer

UR - https://www.scopus.com/pages/publications/85037673424

U2 - 10.1021/acsami.6b11361

DO - 10.1021/acsami.6b11361

M3 - Journal article

C2 - 28032747

AN - SCOPUS:85037673424

SN - 1944-8244

VL - 9

SP - 22

EP - 28

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 1

ER -

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Abstract

UN SDGs

Keywords

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