A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing

Bin Hu; Kwang Sun Kim; Ik Tae Im; Byung Han Yun

A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing

Bin Hu^*
, Kwang Sun Kim
, Ik Tae Im
, Byung Han Yun

^*Corresponding author for this work

Mechanical Design Engineering

Korea University of Technology and Education
Iksan National College
AVACO Co. LTD

Research output: Contribution to conference › Conference paper › peer-review

Abstract

A thermal model was constructed to simulate the combined heat transfer phenomena, including thermal radiation in the heating chamber, during the sputtering process. The changes in thermal characteristics when thermal radiation occurred within the chamber system were analyzed using CFD (Computational Fluid Dynamics) method. The research emphasis in this paper was to explore the temperature distribution on the large glass panel. In order to achieve the temperature uniformity criterion (± 15 °C), the chamber design was improved to prevent a significant difference between temperature distributions. Several design factors were made to observe the effect on temperature distribution. After optimizing the chamber structure, the IR heater settings were in the end determined to meet the standards of three different sputtering circumstances.

Original language	English
Title of host publication	2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008
Publisher	ASME
Pages	503-510
Number of pages	8
ISBN (Print)	9780791848487
State	Published - 2009
Event	2008 ASME Summer Heat Transfer Conference, HT 2008 - Jacksonville, FL, United States Duration: 2008.08.10 → 2008.08.14

Publication series

Name	2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008
Volume	3

Conference

Conference	2008 ASME Summer Heat Transfer Conference, HT 2008
Country/Territory	United States
City	Jacksonville, FL
Period	08.08.10 → 08.08.14

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

Chamber
Glass panel
Optimal design
Temperature distribution
Thermal radiation model

Cite this

@inproceedings{202a5777b5794df090e0d051c6b002e9,

title = "A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing",

abstract = "A thermal model was constructed to simulate the combined heat transfer phenomena, including thermal radiation in the heating chamber, during the sputtering process. The changes in thermal characteristics when thermal radiation occurred within the chamber system were analyzed using CFD (Computational Fluid Dynamics) method. The research emphasis in this paper was to explore the temperature distribution on the large glass panel. In order to achieve the temperature uniformity criterion (± 15 °C), the chamber design was improved to prevent a significant difference between temperature distributions. Several design factors were made to observe the effect on temperature distribution. After optimizing the chamber structure, the IR heater settings were in the end determined to meet the standards of three different sputtering circumstances.",

keywords = "Chamber, Glass panel, Optimal design, Temperature distribution, Thermal radiation model",

author = "Bin Hu and Kim, \{Kwang Sun\} and Im, \{Ik Tae\} and Yun, \{Byung Han\}",

year = "2009",

language = "English",

isbn = "9780791848487",

series = "2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008",

publisher = "ASME",

pages = "503--510",

booktitle = "2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008",

note = "2008 ASME Summer Heat Transfer Conference, HT 2008 ; Conference date: 10-08-2008 Through 14-08-2008",

}

Hu, B, Kim, KS, Im, IT & Yun, BH 2009, A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing. in 2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008. 2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008, vol. 3, ASME, pp. 503-510, 2008 ASME Summer Heat Transfer Conference, HT 2008, Jacksonville, FL, United States, 08.08.10.

A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing. / Hu, Bin; Kim, Kwang Sun; Im, Ik Tae et al.
2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008. ASME, 2009. p. 503-510 (2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008; Vol. 3).

Research output: Contribution to conference › Conference paper › peer-review

TY - GEN

T1 - A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing

AU - Hu, Bin

AU - Kim, Kwang Sun

AU - Im, Ik Tae

AU - Yun, Byung Han

PY - 2009

Y1 - 2009

N2 - A thermal model was constructed to simulate the combined heat transfer phenomena, including thermal radiation in the heating chamber, during the sputtering process. The changes in thermal characteristics when thermal radiation occurred within the chamber system were analyzed using CFD (Computational Fluid Dynamics) method. The research emphasis in this paper was to explore the temperature distribution on the large glass panel. In order to achieve the temperature uniformity criterion (± 15 °C), the chamber design was improved to prevent a significant difference between temperature distributions. Several design factors were made to observe the effect on temperature distribution. After optimizing the chamber structure, the IR heater settings were in the end determined to meet the standards of three different sputtering circumstances.

AB - A thermal model was constructed to simulate the combined heat transfer phenomena, including thermal radiation in the heating chamber, during the sputtering process. The changes in thermal characteristics when thermal radiation occurred within the chamber system were analyzed using CFD (Computational Fluid Dynamics) method. The research emphasis in this paper was to explore the temperature distribution on the large glass panel. In order to achieve the temperature uniformity criterion (± 15 °C), the chamber design was improved to prevent a significant difference between temperature distributions. Several design factors were made to observe the effect on temperature distribution. After optimizing the chamber structure, the IR heater settings were in the end determined to meet the standards of three different sputtering circumstances.

KW - Chamber

KW - Glass panel

KW - Optimal design

KW - Temperature distribution

KW - Thermal radiation model

UR - https://www.scopus.com/pages/publications/70349121769

M3 - Conference paper

AN - SCOPUS:70349121769

SN - 9780791848487

T3 - 2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008

SP - 503

EP - 510

BT - 2008 Proceedings of the ASME Summer Heat Transfer Conference, HT 2008

PB - ASME

T2 - 2008 ASME Summer Heat Transfer Conference, HT 2008

Y2 - 10 August 2008 through 14 August 2008

ER -

A study on the optimal design of heating chamber in sputtering process for large-sized LCD panel manufacturing

Abstract

Publication series

Conference

UN SDGs

Keywords

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Cite this