Abnormal dopant distribution in POCl3-diffused N+ emitter of textured silicon solar cells

  • Young Woo Ok*
  • , Ajeet Rohatgi
  • , Yeon Ho Kil
  • , Sung Eun Park
  • , Dong Hwan Kim
  • , Joon Sung Lee
  • , Chel Jong Choi
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We investigated 2-D dopant distribution in a POCl3 -diffused n+ emitter formed on textured Si solar cells using transmission electron microscopy (TEM) combined with selective chemical etching. TEM and simulation results demonstrate that the convex and concave regions of a pyramid in the textured Si surface show deeper and shallower junctions, respectively. By considering a strong dependence of phosphorus (P) diffusion on the Si interstitials, the abnormal profile of n+ emitter in the textured Si surface could be attributed to the inhomogeneous distribution of Si interstitials caused by the geometry of the pyramid texture.

Original languageEnglish
Article number5680936
Pages (from-to)351-353
Number of pages3
JournalIEEE Electron Device Letters
Volume32
Issue number3
DOIs
StatePublished - 2011.03

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • Junction
  • selective chemical etching
  • Si interstitial
  • solar cells
  • transmission electron microscopy (TEM)

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum

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