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An optimum strategy for the low voltage operation of the mechanical switch

  • Byung Hyun Lee
  • , Min Ho Kang
  • , Jae Hur
  • , Dae Chul Ahn
  • , Dong Il Lee
  • , Hagyoul Bae
  • , Yang Kyu Choi*
  • *Corresponding author for this work
  • Korea Advanced Institute of Science and Technology
  • Samsung
  • National NanoFab Center

Research output: Contribution to conferenceConference paperpeer-review

Abstract

A study of the effective scaling of the pull-in operation voltage (VP) in a nano electro-mechanical (NEM) switch device was carried out. The atomic layer deposition (ALD) technique which can stably build a gap was used to form a sub-10 nm nanogap without stiction. Here, the use of a dielectric layer with a high dielectric constant (high-k) effectively reduced VP via an increase in the electrostatic force. The geometric dependency was analyzed in an experiment with various dimensions. Also, the change of VP was interpreted by numerical equation-based modeling. Thus, this study suggests a guideline related to the feasibility of the low-voltage operation and effective scaling down of a NEM switch.

Original languageEnglish
Title of host publicationIEEE-NANO 2015 - 15th International Conference on Nanotechnology
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1082-1086
Number of pages5
ISBN (Electronic)9781467381550
DOIs
StatePublished - 2015
Event15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015 - Rome, Italy
Duration: 2015.07.272015.07.30

Publication series

NameIEEE-NANO 2015 - 15th International Conference on Nanotechnology

Conference

Conference15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015
Country/TerritoryItaly
CityRome
Period15.07.2715.07.30

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