| Original language | Korean |
|---|---|
| Journal | Chemistry of Materials |
| State | Published - 2016.10.11 |
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Atomic Layer Deposition of GeTe Films Using Ge{N[Si(CH3)(3)](2)}(2), {(CH3)(3)Si}(2)Te, and Methanol
- Deok-Yong Cho
Research output: Contribution to journal › Journal article › peer-review