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Atomic variations in digital alloy InGaP/InGaAlP multiple quantum wells due to thermal treatment

  • Jae Won Shin
  • , Hu Young Jeong
  • , Seung Jo Yoo
  • , Seok Hoon Lee
  • , Jun Hee Han
  • , Jeong Yong Lee
  • , Jun Sung Ahn
  • , Chang Young Park
  • , Kwang Wook Park
  • , Yong Tak Lee
  • , Jin Gyu Kim*
  • , Tae Whan Kim
  • *Corresponding author for this work
  • Korea Basic Science Institute
  • Institute for Basic Science
  • Ulsan National Institute of Science and Technology
  • Korea Advanced Institute of Science and Technology
  • Hanyang University
  • Gwangju Institute of Science and Technology

Research output: Contribution to journalJournal articlepeer-review

Abstract

High-resolution transmission electron microscopy (HRTEM) images showed that the lattice distortion of as-grown InGaP/InGaAlP multiple quantum wells (MQWs) appeared to be due to the small thickness of the alloyed layers, and that their distortion was relaxed owing to the high atomic mobility. High-angle annular dark-field scanning transmission electron microscopy images demonstrated that the chemical intermixing of Ga and Al atoms between the InAlP and InGaP alloy layers due to thermal annealing relaxed the stress of the InGaAlP layer. The atomic arrangements of the as-grown and annealed MQWs are described on the basis of the experimental results.

Original languageEnglish
Article number115201
JournalJapanese Journal of Applied Physics
Volume53
Issue number11
DOIs
StatePublished - 2014.11.1

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