Auto-Bias Electrical Variable Capacitor of Reduced Active Component Count and Voltage Stress for 13.56 MHz RF Plasma Process

  • Juhwa Min
  • , Yongsug Suh*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

This article introduces a novel electrical variable capacitor (EVC) circuit for use in the impedance matching circuits employed by 13.56 MHz RF plasma systems. The proposed design employs a turn-on/off using bias current and voltage condition technology, reducing the number of active components necessary for the EVC to operate. Experiments comparing the proposed EVC to state-of-the-art alternatives confirmed that the proposed design successfully operated with the reduced number of active components. Proposed EVC of automatic bias action by the power semiconductor switch may improve the impedance matching circuits used in high-power and high-frequency RF plasma system.

Original languageEnglish
Pages (from-to)4994-5004
Number of pages11
JournalIEEE Transactions on Industry Applications
Volume58
Issue number4
DOIs
StatePublished - 2022

Keywords

  • Capacitance variable time
  • Electrical variable capacitor (EVC)
  • Impedance matcher
  • RF plasma
  • Voltage stress

Quacquarelli Symonds(QS) Subject Topics

  • Engineering - Mechanical
  • Computer Science & Information Systems
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum

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