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Band gap tunability of molecular beam epitaxy grown lateral composition modulated GaInP structures by controlling V/III flux ratio

  • K. W. Park*
  • , C. Y. Park
  • , Y. T. Lee
  • *Corresponding author for this work
  • Gwangju Institute of Science and Technology
  • Samsung

Research output: Contribution to journalJournal articlepeer-review

Abstract

Lateral composition modulated (LCM) GaInP structures were grown on (001) GaAs substrate by molecular beam epitaxy with different V/III flux ratios. Band gap of LCM structures could be tuned from 1.93 eV to 1.83 eV by decreasing flux ratio while maintaining the same photoluminescence intensity, enhanced light absorption, and widened absorption spectrum. It is shown that for band gap tuning of LCM structures, flux ratio adjustment is a more viable method compared to growth temperature adjustment.

Original languageEnglish
Article number051903
JournalApplied Physics Letters
Volume101
Issue number5
DOIs
StatePublished - 2012.07.30

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