Abstract
We have fabricated epitaxial p-i-n diode structures, containing a single GaMnAs layer, by using molecular beam epitaxy. For vertical transport measurements, the samples were patterned into mesa structures by using standard photolithography. The low-temperature magnetoresistance shows a strong bias voltage dependence, including sign-changes, similar to those of p-n diodes. The anisotropic magnetoresistance seems to originate from inherent in-plane magnetic anisotropy and the spin-orbit interaction of (Ga,Mn)As. The enhanced magnetoresistance in p-i-n diodes shows that the performance of GaMnAs diodes can be improved by using interface manipulations.
| Original language | English |
|---|---|
| Pages (from-to) | 1725-1729 |
| Number of pages | 5 |
| Journal | Journal of the Korean Physical Society |
| Volume | 54 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2009.04 |
Keywords
- Diode structure
- Magnetic semiconductor
- Tunneling anisotropic magnetoresistance
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