Characteristics of InGaN/GaN Light-Emitting Diode with Si δ-Doped GaN Contact Layer

  • S. R. Jeon
  • , M. S. Jo
  • , T. V. Humg
  • , G. M. Yang*
  • , H. K. Cho
  • , J. Y. Lee
  • , S. W. Hwang
  • , S. J. Son
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We have investigated the characteristics of InGaN/GaN blue light-emitting diodes (LEDs) with a Si δ-doped GaN contact layer. The Si δ-doping of the GaN contact layer in the devices could enhance the Si doping concentration and improve the lateral conductivity in the GaN:Si contact layer without cracking. The operating voltage and dynamic resistance of LEDs with a Si δ-doped GaN contact layer were 3.65 V and 27 Ω at 20 mA, respectively. The operating voltage and dynamic resistance of conventional LEDs with a uniformly doped GaN:Si contact layer were 3.94 V and 32.3 Ω at 20 mA, respectively. Also, the leakage currents at a reverse bias of -10 V were 2.8 μA for δ-doped LEDs and 29 μA for uniformly doped LEDs. However, emission properties such as electroluminescence spectra and output power were not largely affected by utilizing a δ-doped GaN:Si contact layer in the devices.

Original languageEnglish
Pages (from-to)163-166
Number of pages4
JournalPhysica Status Solidi (A) Applied Research
Volume188
Issue number1
DOIs
StatePublished - 2001.11

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Physics & Astronomy

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