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Characteristics of nanocrystalline AlN:Er films co-deposited by using AlN, Er, and SiO2 targets

  • J. W. Lim*
  • , W. Takayama
  • , Y. F. Zhu
  • , J. W. Bae
  • , J. F. Wang
  • , S. Y. Ji
  • , K. Mimura
  • , J. H. Yoo
  • , M. Isshiki
  • *Corresponding author for this work
  • Korea Institute of Geoscience and Mineral Resources
  • Japan Radio Corporation
  • Ministry of Education of the People's Republic of China
  • Tohoku University
  • National NanoFab Center

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report the characteristics of AlN:Er films that were co-deposited by using AlN, Er, and SiO2 targets. The PL emission spectra show strong green emissions of Er3+ ions in AlN:Er films annealed at an optimal temperature of 750 °C, which is attributed to the intra-4f Er3+ transitions of 2H11/2 4I15/2 and 4F7/2 4I15/2. This optimal temperature can activate Er species as an efficient visible luminescence center. High-resolution transmission electron microscopy (HREM) observations showed that the AlN:Er film annealed at 750 °C exhibits the microstructure of AlN nanocrystallites embedded in the amorphous matrix. The occurrence of strong Er3+ emissions in the amorphous-nanocrystalline AlN:Er films by thermal annealing might contribute to an increased number of excitation Er3+ centers and the presence of oxygen related to Er3+ excitation and recombination processes. A distinct visible bluish green emission is also confirmed from the EL device with an amorphous-nanocrystalline AlN:Er active layer.

Original languageEnglish
Pages (from-to)3740-3745
Number of pages6
JournalMaterials Letters
Volume61
Issue number17
DOIs
StatePublished - 2007.07

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