Characteristics of nanocrystalline AlN:Er films co-deposited by using AlN, Er, and SiO2 targets
- J. W. Lim*
- , W. Takayama
- , Y. F. Zhu
- , J. W. Bae
- , J. F. Wang
- , S. Y. Ji
- , K. Mimura
- , J. H. Yoo
- , M. Isshiki
*Corresponding author for this work
- Korea Institute of Geoscience and Mineral Resources
- Japan Radio Corporation
- Ministry of Education of the People's Republic of China
- Tohoku University
- National NanoFab Center
Research output: Contribution to journal › Journal article › peer-review
11
Link opens in a new tab
Scopus
citations