Codoping characteristics of Zn with Mg in GaN

  • K. S. Kim
  • , M. S. Han
  • , G. M. Yang*
  • , C. J. Youn
  • , H. J. Lee
  • , H. K. Cho
  • , J. Y. Lee
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

The doping characteristics of Mg-Zn codoped GaN films grown by metalorganic chemical vapor deposition are investigated. By means of the concept of Mg-Zn codoping technique, we have grown p-GaN showing a low electrical resistivity (0.72 Ω cm) and a high hole concentration (8.5 × 1017 cm-3) without structural degradation of the film. It is thought that the codoping of Zn atoms with Mg raises the Mg activation ratio by reducing the hydrogen solubility in p-GaN. In addition, the measured specific contact resistance of Mg-Zn codoped GaN film is 5.0×10-4 Ω cm2, which is one order of magnitude lower than that of Mg doped only GaN film (1.9×10-3 Ω cm2).

Original languageEnglish
Pages (from-to)1123-1125
Number of pages3
JournalApplied Physics Letters
Volume77
Issue number8
DOIs
StatePublished - 2000.08.21

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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