Conformality of Pb(Zr,Ti)O3 films deposited on trench structures having submicrometer diameter and various aspect ratios

Atsushi Nagai; Jun Minamidate; Gouji Asano; Chel Jong Choi; Choong Rae Cho; Youngsoo Park; Hiroshi Funakubo

doi:10.1149/1.2137470

Conformality of Pb(Zr,Ti)O₃ films deposited on trench structures having submicrometer diameter and various aspect ratios

Atsushi Nagai^*
, Jun Minamidate
, Gouji Asano
, Chel Jong Choi
, Choong Rae Cho
, Youngsoo Park
, Hiroshi Funakubo

^*Corresponding author for this work

Department of Semiconductor Science and Technology

Institute of Science Tokyo
Samsung

Research output: Contribution to journal › Journal article › peer-review

13 Scopus citations

Abstract

Pb(Zr,Ti)O₃ films were deposited at 540°C on trenched substrates with submicrometer diameters by pulsed-metallorganic chemical vapor deposition. The respective fluctuations of Pb/(Zr+Ti) and Zr/(Zr+Ti) molar ratios were in a range of ±19 and ±17% from each average value at the sidewalls of trenches with a diameter of 200 nm and a depth of 685 nm (aspect ratio of 3.4). The sidewall-bottom step coverage was successfully maintained above 70% up to a depth of 685 nm. The present results show the possibility of uniform Pb(Zr,Ti)O₃ film deposition on the trench substrates with high aspect ratio.

Original language	English
Pages (from-to)	C15-C18
Journal	Electrochemical and Solid-State Letters
Volume	9
Issue number	1
DOIs	https://doi.org/10.1149/1.2137470
State	Published - 2006

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title = "Conformality of Pb(Zr,Ti)O3 films deposited on trench structures having submicrometer diameter and various aspect ratios",

abstract = "Pb(Zr,Ti)O3 films were deposited at 540°C on trenched substrates with submicrometer diameters by pulsed-metallorganic chemical vapor deposition. The respective fluctuations of Pb/(Zr+Ti) and Zr/(Zr+Ti) molar ratios were in a range of ±19 and ±17\% from each average value at the sidewalls of trenches with a diameter of 200 nm and a depth of 685 nm (aspect ratio of 3.4). The sidewall-bottom step coverage was successfully maintained above 70\% up to a depth of 685 nm. The present results show the possibility of uniform Pb(Zr,Ti)O3 film deposition on the trench substrates with high aspect ratio.",

author = "Atsushi Nagai and Jun Minamidate and Gouji Asano and Choi, \{Chel Jong\} and Cho, \{Choong Rae\} and Youngsoo Park and Hiroshi Funakubo",

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doi = "10.1149/1.2137470",

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T1 - Conformality of Pb(Zr,Ti)O3 films deposited on trench structures having submicrometer diameter and various aspect ratios

AU - Nagai, Atsushi

AU - Minamidate, Jun

AU - Asano, Gouji

AU - Choi, Chel Jong

AU - Cho, Choong Rae

AU - Park, Youngsoo

AU - Funakubo, Hiroshi

PY - 2006

Y1 - 2006

N2 - Pb(Zr,Ti)O3 films were deposited at 540°C on trenched substrates with submicrometer diameters by pulsed-metallorganic chemical vapor deposition. The respective fluctuations of Pb/(Zr+Ti) and Zr/(Zr+Ti) molar ratios were in a range of ±19 and ±17% from each average value at the sidewalls of trenches with a diameter of 200 nm and a depth of 685 nm (aspect ratio of 3.4). The sidewall-bottom step coverage was successfully maintained above 70% up to a depth of 685 nm. The present results show the possibility of uniform Pb(Zr,Ti)O3 film deposition on the trench substrates with high aspect ratio.

AB - Pb(Zr,Ti)O3 films were deposited at 540°C on trenched substrates with submicrometer diameters by pulsed-metallorganic chemical vapor deposition. The respective fluctuations of Pb/(Zr+Ti) and Zr/(Zr+Ti) molar ratios were in a range of ±19 and ±17% from each average value at the sidewalls of trenches with a diameter of 200 nm and a depth of 685 nm (aspect ratio of 3.4). The sidewall-bottom step coverage was successfully maintained above 70% up to a depth of 685 nm. The present results show the possibility of uniform Pb(Zr,Ti)O3 film deposition on the trench substrates with high aspect ratio.

UR - https://www.scopus.com/pages/publications/33645513281

U2 - 10.1149/1.2137470

DO - 10.1149/1.2137470

M3 - Journal article

AN - SCOPUS:33645513281

SN - 1099-0062

VL - 9

SP - C15-C18

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

IS - 1

ER -

Conformality of Pb(Zr,Ti)O₃ films deposited on trench structures having submicrometer diameter and various aspect ratios

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