Correlation between silicon particles and modulated crossed magnetic field in silane plasmas

K. Tazoe; S. C. Yang; Y. Maemura; M. Ohtsu; H. Fujiyama

doi:10.1016/S0040-6090(98)01520-X

Correlation between silicon particles and modulated crossed magnetic field in silane plasmas

K. Tazoe^*
, S. C. Yang
, Y. Maemura
, M. Ohtsu
, H. Fujiyama

^*Corresponding author for this work

Department of Electrical Engineering

Nagasaki University

Research output: Contribution to journal › Conference article › peer-review

3 Scopus citations

Abstract

The influence of a modulated crossed magnetic field on silicon particles have been investigated by a laser light scattering method and a field emission scanning electron microscopy (FESEM) in SiH₄(10%)/Ar plasmas. In the initial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased, then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that the small silicon particles in the stage of the initial growth are effectively removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles.

Original language	English
Pages (from-to)	55-58
Number of pages	4
Journal	Thin Solid Films
Volume	341
Issue number	1
DOIs	https://doi.org/10.1016/S0040-6090(98)01520-X
State	Published - 1999.03.12

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title = "Correlation between silicon particles and modulated crossed magnetic field in silane plasmas",

abstract = "The influence of a modulated crossed magnetic field on silicon particles have been investigated by a laser light scattering method and a field emission scanning electron microscopy (FESEM) in SiH4(10\%)/Ar plasmas. In the initial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased, then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that the small silicon particles in the stage of the initial growth are effectively removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles.",

author = "K. Tazoe and Yang, \{S. C.\} and Y. Maemura and M. Ohtsu and H. Fujiyama",

year = "1999",

month = mar,

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doi = "10.1016/S0040-6090(98)01520-X",

language = "English",

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TY - JOUR

T1 - Correlation between silicon particles and modulated crossed magnetic field in silane plasmas

AU - Tazoe, K.

AU - Yang, S. C.

AU - Maemura, Y.

AU - Ohtsu, M.

AU - Fujiyama, H.

PY - 1999/3/12

Y1 - 1999/3/12

N2 - The influence of a modulated crossed magnetic field on silicon particles have been investigated by a laser light scattering method and a field emission scanning electron microscopy (FESEM) in SiH4(10%)/Ar plasmas. In the initial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased, then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that the small silicon particles in the stage of the initial growth are effectively removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles.

AB - The influence of a modulated crossed magnetic field on silicon particles have been investigated by a laser light scattering method and a field emission scanning electron microscopy (FESEM) in SiH4(10%)/Ar plasmas. In the initial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased, then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that the small silicon particles in the stage of the initial growth are effectively removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles.

UR - https://www.scopus.com/pages/publications/0032658726

U2 - 10.1016/S0040-6090(98)01520-X

DO - 10.1016/S0040-6090(98)01520-X

M3 - Conference article

AN - SCOPUS:0032658726

SN - 0040-6090

VL - 341

SP - 55

EP - 58

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1

ER -

Correlation between silicon particles and modulated crossed magnetic field in silane plasmas

Abstract

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