Defect trap on the edge of the slit in the patterned vertical alignment cell for dynamic stability of disclination lines

We studied the liquid crystal (LC) dynamic stability of the defect around the slit edge (wing pattern) in the patterned vertical alignment (PVA) cell. LC dynamics is very unstable near the edge of the slit because there is a strong competition of strain energy of LC director around active area and edge on the wing pattern, so that we can easily find unstable defect line on the slit. It is possible to control LC dynamics near the edge of the slit by using different wing shape. In this paper we propose an advanced wing shape which includes defect trap for sticking the defect moving to the out of the active area. This shape prevent the generation of the defect core on the slit in the active area even if we increase the operation voltage, so that LC dynamics around the wing pattern can be very stable. This result indicates that advanced wing shape increase the transmittance and response time.