Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence

Yoon Kyeung Lee; Ki Jun Yu; Yerim Kim; Younghee Yoon; Zhaoqian Xie; Enming Song; Haiwen Luan; Xue Feng; Yonggang Huang; John A. Rogers

Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence

Yoon Kyeung Lee
, Ki Jun Yu
, Yerim Kim
, Younghee Yoon
, Zhaoqian Xie
, Enming Song
, Haiwen Luan
, Xue Feng
, Yonggang Huang
, John A. Rogers^*

^*Corresponding author for this work

Electronic Materials Engineering

University of Illinois at Urbana-Champaign
Yonsei University
Northwestern University
Fudan University
Tsinghua University

Research output: Contribution to conference › Conference paper › peer-review

Abstract

Accelerated dissolution, High ionic concentrations for all ion types, Higher pH, At sirmilar ionic strength and pH, Ca'catalyzes the dissolution more effectively than monovalent cations (Na⁺ K⁺)and Mg² especially at higher Ph, HPO/-at high ionic strength, Reduced dissolution rate, Silicic acid at high ionic strength.

Original language	English
Title of host publication	Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting
Publisher	AIChE
Pages	1028
Number of pages	1
ISBN (Electronic)	9781510858084
State	Published - 2017
Event	Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting - Minneapolis, United States Duration: 2017.10.29 → 2017.11.3

Publication series

Name	Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting
Volume	2017-October

Conference

Conference	Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting
Country/Territory	United States
City	Minneapolis
Period	17.10.29 → 17.11.3

Cite this

Lee, Y. K., Yu, K. J., Kim, Y., Yoon, Y., Xie, Z., Song, E., Luan, H., Feng, X., Huang, Y., & Rogers, J. A. (2017). Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence. In Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting (pp. 1028). (Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting; Vol. 2017-October). AIChE.

Lee, Yoon Kyeung ; Yu, Ki Jun ; Kim, Yerim et al. / Dissolution kinetics of ultrathin thermally grown silicon oxide : pH, ions, silicic acid dependence. Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting. AIChE, 2017. pp. 1028 (Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting).

@inproceedings{59838190a63940738f6ca58d745419c4,

title = "Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence",

abstract = "Accelerated dissolution, High ionic concentrations for all ion types, Higher pH, At sirmilar ionic strength and pH, Ca'catalyzes the dissolution more effectively than monovalent cations (Na+ K+)and Mg2 especially at higher Ph, HPO/-at high ionic strength, Reduced dissolution rate, Silicic acid at high ionic strength.",

author = "Lee, \{Yoon Kyeung\} and Yu, \{Ki Jun\} and Yerim Kim and Younghee Yoon and Zhaoqian Xie and Enming Song and Haiwen Luan and Xue Feng and Yonggang Huang and Rogers, \{John A.\}",

note = "Publisher Copyright: {\textcopyright} 2018 AIChE. All rights reserved.; Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting ; Conference date: 29-10-2017 Through 03-11-2017",

year = "2017",

language = "English",

series = "Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting",

publisher = "AIChE",

pages = "1028",

booktitle = "Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting",

}

Lee, YK, Yu, KJ, Kim, Y, Yoon, Y, Xie, Z, Song, E, Luan, H, Feng, X, Huang, Y & Rogers, JA 2017, Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence. in Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting. Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting, vol. 2017-October, AIChE, pp. 1028, Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting, Minneapolis, United States, 17.10.29.

Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence. / Lee, Yoon Kyeung; Yu, Ki Jun; Kim, Yerim et al.
Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting. AIChE, 2017. p. 1028 (Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting; Vol. 2017-October).

Research output: Contribution to conference › Conference paper › peer-review

TY - GEN

T1 - Dissolution kinetics of ultrathin thermally grown silicon oxide

T2 - Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting

AU - Lee, Yoon Kyeung

AU - Yu, Ki Jun

AU - Kim, Yerim

AU - Yoon, Younghee

AU - Xie, Zhaoqian

AU - Song, Enming

AU - Luan, Haiwen

AU - Feng, Xue

AU - Huang, Yonggang

AU - Rogers, John A.

PY - 2017

Y1 - 2017

N2 - Accelerated dissolution, High ionic concentrations for all ion types, Higher pH, At sirmilar ionic strength and pH, Ca'catalyzes the dissolution more effectively than monovalent cations (Na+ K+)and Mg2 especially at higher Ph, HPO/-at high ionic strength, Reduced dissolution rate, Silicic acid at high ionic strength.

AB - Accelerated dissolution, High ionic concentrations for all ion types, Higher pH, At sirmilar ionic strength and pH, Ca'catalyzes the dissolution more effectively than monovalent cations (Na+ K+)and Mg2 especially at higher Ph, HPO/-at high ionic strength, Reduced dissolution rate, Silicic acid at high ionic strength.

UR - https://www.scopus.com/pages/publications/85048832161

M3 - Conference paper

AN - SCOPUS:85048409518

T3 - Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting

SP - 1028

BT - Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting

PB - AIChE

Y2 - 29 October 2017 through 3 November 2017

ER -

Lee YK, Yu KJ, Kim Y, Yoon Y, Xie Z, Song E et al. Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence. In Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting. AIChE. 2017. p. 1028. (Nanoscale Science and Engineering Forum 2017 - Core Programming Area of the 2017 AIChE Annual Meeting).

Dissolution kinetics of ultrathin thermally grown silicon oxide: pH, ions, silicic acid dependence

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