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Double Negative Differential Resistance Device Based on Hafnium Disulfide/Pentacene Hybrid Structure

  • Kil Su Jung
  • , Keun Heo
  • , Min Je Kim
  • , Maksim Andreev
  • , Seunghwan Seo
  • , Jin Ok Kim
  • , Ji Hye Lim
  • , Kwan Ho Kim
  • , Sungho Kim
  • , Ki Seok Kim
  • , Geun Yong Yeom
  • , Jeong Ho Cho*
  • , Jin Hong Park*
  • *Corresponding author for this work
  • Sungkyunkwan University
  • Samsung
  • Jet Propulsion Laboratory, California Institute of Technology
  • Massachusetts Institute of Technology
  • Yonsei University

Research output: Contribution to journalJournal articlepeer-review

Abstract

Recently, combinations of 2D van der Waals (2D vdW) materials and organic materials have attracted attention because they facilitate the formation of various heterojunctions with excellent interface quality owing to the absence of dangling bonds on their surface. In this work, a double negative differential resistance (D-NDR) characteristic of a hybrid 2D vdW/organic tunneling device consisting of a hafnium disulfide/pentacene heterojunction and a 3D pentacene resistor is reported. This D-NDR phenomenon is achieved by precisely controlling an NDR peak voltage with the pentacene resistor and then integrating two distinct NDR devices in parallel. Then, the operation of a controllable-gain amplifier configured with the D-NDR device and an n-channel transistor is demonstrated using the Cadence Spectre simulation platform. The proposed D-NDR device technology based on a hybrid 2D vdW/organic heterostructure provides a scientific foundation for various circuit applications that require the NDR phenomenon.

Original languageEnglish
Article number2000991
JournalAdvanced Science
Volume7
Issue number19
DOIs
StatePublished - 2020.10.1

Keywords

  • HfS
  • hybrid structures
  • negative differential resistance (NDR)
  • pentacene

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