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DSC studies upon thermal curing of methylsilsesquinoxane

  • Kitae Song*
  • , Byoung Suhk Kim
  • , Jae Wook Lee
  • , Hee Woo Rhee
  • *Corresponding author for this work
  • Sogang University

Research output: Contribution to journalJournal articlepeer-review

Abstract

A conventional DSC was used to investigate the thermal curing behavior of methylsilsesquioxane (MSSQ) which transforms into the low dielectric constant material, poly(MSSQ). Temperature scan of MSSQ up to 350°C revealed that the curing of MSSQ is an endothermic reaction that occurs over the wide temperature range. From the isothermal scan of MSSQ, it was found that the curing of MSSQ follows the first-order reaction.

Original languageEnglish
Pages (from-to)309-312
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume370
DOIs
StatePublished - 2001

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • Low dielectric constant material
  • Methylsilsesquioxane
  • Thermal curing

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