Effect of annealing on the electrochromic properties of WO3 thin films fabricated by Electrophoretic Deposition

Yoon Tae Park; Ki Tae Lee

Effect of annealing on the electrochromic properties of WO₃ thin films fabricated by Electrophoretic Deposition

Yoon Tae Park
, Ki Tae Lee^*

^*Corresponding author for this work

Electronic Materials Engineering

Jeonbuk National University

Research output: Contribution to journal › Journal article › peer-review

2 Scopus citations

Abstract

WO₃ thin films were fabricated by an electrophoretic deposition (EPD) process. As-deposited WO₃ thin films was annealed at 100 °C for 24 hrs to improve the electrochromic properties with better cyclability. While the surface roughness decreased as a result of the annealing process, the film thickness increased. The annealed WO₃ thin film showed better performance than the as-deposited film with a coloration efficiency of 41.5 cm² • C ¹.

Original language	English
Pages (from-to)	632-635
Number of pages	4
Journal	Journal of Ceramic Processing Research
Volume	14
Issue number	5
State	Published - 2013

Keywords

Annealing
Ceramics
Electrochromism
Thin films
Tungsten trioxide

Quacquarelli Symonds(QS) Subject Topics

Materials Science

Cite this

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title = "Effect of annealing on the electrochromic properties of WO3 thin films fabricated by Electrophoretic Deposition",

abstract = "WO3 thin films were fabricated by an electrophoretic deposition (EPD) process. As-deposited WO3 thin films was annealed at 100 °C for 24 hrs to improve the electrochromic properties with better cyclability. While the surface roughness decreased as a result of the annealing process, the film thickness increased. The annealed WO3 thin film showed better performance than the as-deposited film with a coloration efficiency of 41.5 cm2 • C 1.",

keywords = "Annealing, Ceramics, Electrochromism, Thin films, Tungsten trioxide",

author = "Park, \{Yoon Tae\} and Lee, \{Ki Tae\}",

year = "2013",

language = "English",

volume = "14",

pages = "632--635",

journal = "Journal of Ceramic Processing Research",

issn = "1229-9162",

number = "5",

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TY - JOUR

T1 - Effect of annealing on the electrochromic properties of WO3 thin films fabricated by Electrophoretic Deposition

AU - Park, Yoon Tae

AU - Lee, Ki Tae

PY - 2013

Y1 - 2013

N2 - WO3 thin films were fabricated by an electrophoretic deposition (EPD) process. As-deposited WO3 thin films was annealed at 100 °C for 24 hrs to improve the electrochromic properties with better cyclability. While the surface roughness decreased as a result of the annealing process, the film thickness increased. The annealed WO3 thin film showed better performance than the as-deposited film with a coloration efficiency of 41.5 cm2 • C 1.

AB - WO3 thin films were fabricated by an electrophoretic deposition (EPD) process. As-deposited WO3 thin films was annealed at 100 °C for 24 hrs to improve the electrochromic properties with better cyclability. While the surface roughness decreased as a result of the annealing process, the film thickness increased. The annealed WO3 thin film showed better performance than the as-deposited film with a coloration efficiency of 41.5 cm2 • C 1.

KW - Annealing

KW - Ceramics

KW - Electrochromism

KW - Thin films

KW - Tungsten trioxide

UR - https://www.scopus.com/pages/publications/84896450056

M3 - Journal article

AN - SCOPUS:84896450056

SN - 1229-9162

VL - 14

SP - 632

EP - 635

JO - Journal of Ceramic Processing Research

JF - Journal of Ceramic Processing Research

IS - 5

ER -

Effect of annealing on the electrochromic properties of WO₃ thin films fabricated by Electrophoretic Deposition

Abstract

Keywords

Quacquarelli Symonds(QS) Subject Topics

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