Effect of heavy inert ion strikes on cell density-dependent profile variation and distortion during the etching process for high-aspect ratio features
- Hyoungcheol Kwon*
- , Imhee Won
- , Songhee Han
- , Dong Hun Yu
- , Deuk Chul Kwon
- , Yeon Ho Im
- , Felipe Iza
- , Dongyean Oh
- , Sung Kye Park
- , Seonyong Cha
*Corresponding author for this work
- SK Corporation
- Loughborough University
- Kyungwon Tech. Co. Ltd.
- National Fusion Research Institute
- Pohang University of Science and Technology
Research output: Contribution to journal › Journal article › peer-review
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