Effects of deposition of an ultra-thin Al2O3 layer via atomic layer deposition on electrochromic property, self-discharge, and discharge capacity of photo-electrochromic devices

Ki-Tae Lee

Effects of deposition of an ultra-thin Al2O3 layer via atomic layer deposition on electrochromic property, self-discharge, and discharge capacity of photo-electrochromic devices

Ki-Tae Lee

Electronic Materials Engineering

Research output: Contribution to journal › Journal article › peer-review

Original language	Korean
Journal	Journal of Ceramic Processing Research
State	Published - 2024.02.1

Cite this

@article{7674349f034e485d8de1777cc07f7719,

title = "Effects of deposition of an ultra-thin Al2O3 layer via atomic layer deposition on electrochromic property, self-discharge, and discharge capacity of photo-electrochromic devices",

author = "Ki-Tae Lee",

year = "2024",

month = feb,

day = "1",

language = "Korean",

journal = "Journal of Ceramic Processing Research",

issn = "1229-9162",

}