Electrical and optical properties of nickel thin-films fabricated by using oblique-angle deposition

When investigating nickel (Ni) thin films deposited by using an oblique angle deposition (OAD) technique, we find a strong correlation between the structural, electrical, and optical properties. The microstructure of the Ni thin-films is largely influenced by the deposition angle of the OAD technique. By increasing the deposition angle, we find that the sheet resistance of the Ni thin-films increases superlinearly and that the optical reflectance of the films increases. These results are explained by the degree of formation of a columnar nanostructure during OAD deposition.