Abstract
The Schottky barrier heights of molybdenum (Mo) on n-GaN were investigated as a function of annealing temperature by current-voltage (I-V) and capacitance-voltage (C-V) techniques. The Schottky barrier height of the as-deposited Mo/n-GaN was found to be 0.81 eV (I-V) and 1.02 eV (C-V), respectively. However, both measurements indicate that the barrier height slightly decreases upon annealing at 400°C for 1 min in nitrogen ambient. The barrier height of Mo/n-GaN Schottky contacts at 400°C was determined to be 0.74 and 0.92 eV, respectively. Further, an increase in annealing temperature up to 600°C, decreased the barrier height to 0.56 and 0.73 eV. The Mo Schottky contact was also shown to be fairly stable during annealing at 400°C.
| Original language | English |
|---|---|
| Pages (from-to) | 30-33 |
| Number of pages | 4 |
| Journal | Materials Science and Engineering: B |
| Volume | 112 |
| Issue number | 1 |
| DOIs | |
| State | Published - 2004.09.15 |
Keywords
- I-V and C-V techniques
- Mo/n-GaN Schottky diode
- Schottky barrier height
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