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Electrical characteristics of molybdenum Schottky contacts on n-type GaN

  • C. K. Ramesh
  • , V. Rajagopal Reddy*
  • , Chel Jong Choi
  • *Corresponding author for this work
  • University of Mysore
  • Samsung

Research output: Contribution to journalJournal articlepeer-review

Abstract

The Schottky barrier heights of molybdenum (Mo) on n-GaN were investigated as a function of annealing temperature by current-voltage (I-V) and capacitance-voltage (C-V) techniques. The Schottky barrier height of the as-deposited Mo/n-GaN was found to be 0.81 eV (I-V) and 1.02 eV (C-V), respectively. However, both measurements indicate that the barrier height slightly decreases upon annealing at 400°C for 1 min in nitrogen ambient. The barrier height of Mo/n-GaN Schottky contacts at 400°C was determined to be 0.74 and 0.92 eV, respectively. Further, an increase in annealing temperature up to 600°C, decreased the barrier height to 0.56 and 0.73 eV. The Mo Schottky contact was also shown to be fairly stable during annealing at 400°C.

Original languageEnglish
Pages (from-to)30-33
Number of pages4
JournalMaterials Science and Engineering: B
Volume112
Issue number1
DOIs
StatePublished - 2004.09.15

Keywords

  • I-V and C-V techniques
  • Mo/n-GaN Schottky diode
  • Schottky barrier height

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