Enhanced photocatalytic properties of nanoclustered p-doped tio ₂ films deposited by advanced atmospheric plasma jet

A facile preparation of P-doped TiO ₂ nanoclusters onto fluorine-doped tin oxide (FTO) glass by an advanced atmospheric plasma jet (AAP jet) is reported here. Titanium tetrachloride (TiCl ₄) and phosphorus trichloride (PCl ₃) were used as precursors. Radio frequencies were used to generate plasma at fix powder with Argon as carrier gas. Films were deposited at 500 °C for 10 minutes. For comparison, as-prepared, annealed and deposited at 500 °C samples were studied for chemical/ physical properties by scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Optical properties were studied by using UV-Vis spectroscopy which indicated a reduction in optical band with P-doping. The rhodamine B (Rh-B) degradation by P-doped TiO ₂ deposited at 500 °C showed enhanced degradation efficiency than that of annealed TiO ₂. The suggested deposition method appears to be suitable for the synthesis of photocatalyst with proper control over dopants.