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Excitation power dependence of photoluminescence from GaAs quantum dot prepared by droplet epitaxy method

  • H. Y. Choi*
  • , D. Y. Kim
  • , M. Y. Cho
  • , G. S. Kim
  • , S. M. Jeon
  • , K. G. Yim
  • , M. S. Kim
  • , D. Y. Lee
  • , J. S. Kim
  • , J. S. Kim
  • , J. S. Son
  • , J. I. Lee
  • , J. Y. Leem
  • *Corresponding author for this work
  • Inje University
  • Samsung
  • Yeungnam University
  • Kyungwoon University
  • Korea Research Institute of Standards and Science

Research output: Contribution to conferenceConference paperpeer-review

Abstract

GaAs quantum dot (QD) was grown by droplet epitaxy (DE) method and the excitation power dependence of photoluminescence (PL) were carried out. To investigate the effect of annealing temperature on QDs optical properties, the two step RTA process was carried out in a various temperature range from 800 to 1000°C. As the thermal annealing temperature increases, the PL peak position is blue-shifted due to the change of the composition and size distribution of QDs, and the highest PL intensity is observed at the sample annealed at 900°C. The integrated PL intensity (I PL) is plotted against the excitation density in a log-log scale and the slope was calculated.

Original languageEnglish
Title of host publicationPhysics of Semiconductors - 30th International Conference on the Physics of Semiconductors, ICPS-30
Pages543-544
Number of pages2
DOIs
StatePublished - 2011
Event30th International Conference on the Physics of Semiconductors, ICPS-30 - Seoul, Korea, Republic of
Duration: 2010.07.252010.07.30

Publication series

NameAIP Conference Proceedings
Volume1399
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference30th International Conference on the Physics of Semiconductors, ICPS-30
Country/TerritoryKorea, Republic of
CitySeoul
Period10.07.2510.07.30

Keywords

  • Droplet epitaxy
  • Gallium arsenide
  • Photoluminescence
  • Quantum dot

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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