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Facile fabrication of polymer waveguide by using photosensitive polyimides

  • Myong Hoon Lee*
  • , Xiangdan Li
  • , Jink Yu Kim
  • , Jaewook Kang
  • , Seongho Paek
  • , Jang Joo Kim
  • *Corresponding author for this work
  • Jeonbuk National University
  • Gwangju Institute of Science and Technology

Research output: Contribution to journalConference articlepeer-review

Abstract

New soluble photosensitive poly(amide-co-imide) containing p-phenylencdiacryloyl moiety was synthesized and its photoreactivity was characterized by UV-Vis spectroscopic methods. The copolymer was synthesized from p-phenylenediacryloyl chloride, bis(3,4-dicarboxyliphenyl)hexafluoropropane dianhydride (6FDA) and two equivalents of 2,2′-bis(trifluoromethyl) benzidine (BTBz) followed by chemical imidization. From the refractive index measurement by prism coupling method, it was found that the refractive index could be varied precisely with respect to the exposure time. Fabrication of passive waveguide was attempted by the photo-modulation of refractive index. Straight waveguide was easily fabricated and the single mode near-field pattern was observed by using 1.55 and 1.3 μm near-IR light.

Keywords

  • Fabrication
  • Photo-modulation
  • Photosensitive polyimides
  • Polymer waveguides
  • Refractive index

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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