Fast and realistic 3D feature profile simulation platform for plasma etching process
- Yeong Geun Yook
- , Hae Sung You
- , Jae Hyeong Park
- , Won Seok Chang
- , Deuk Chul Kwon
- , Jung Sik Yoon
- , Kook Hyun Yoon
- , Sung Sik Shin
- , Dong Hun Yu
- , Yeon Ho Im*
*Corresponding author for this work
- Jeonbuk National University
- National Fusion Research Institute
- Kyungwon Tech
Research output: Contribution to journal › Journal article › peer-review
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