Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air

Rodolphe Mauchauffé; Seongchan Kang; Se Youn Moon

doi:10.1016/j.surfcoat.2018.01.088

Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air

Rodolphe Mauchauffé
, Seongchan Kang
, Se Youn Moon^*

^*Corresponding author for this work

Department of Quantum System Engineering

Jeonbuk National University

Research output: Contribution to journal › Journal article › peer-review

11 Scopus citations

Abstract

In this work, the deposition of titanium oxide thin films at atmospheric pressure via an open-air liquid-assisted plasma-enhanced method has been studied. Morphology, chemical composition, crystal structure as well as optical properties of the deposited thin films were investigated. The method successfully enabled the formation of compact and transparent amorphous TiO₂ layers with a high deposition rate of 1.2 μm per minute. The atmospheric pressure method reported here appears to be a promising up-scalable method for the high rate and large scale deposition of amorphous titanium dioxide thin films.

Original language	English
Pages (from-to)	84-89
Number of pages	6
Journal	Surface and Coatings Technology
Volume	376
DOIs	https://doi.org/10.1016/j.surfcoat.2018.01.088
State	Published - 2019.10.25

Keywords

Atmospheric pressure plasma
Thin film
TiO
Titanium ethoxide

Quacquarelli Symonds(QS) Subject Topics

Materials Science
Chemistry
Physics & Astronomy

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10.1016/j.surfcoat.2018.01.088

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title = "Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air",

abstract = "In this work, the deposition of titanium oxide thin films at atmospheric pressure via an open-air liquid-assisted plasma-enhanced method has been studied. Morphology, chemical composition, crystal structure as well as optical properties of the deposited thin films were investigated. The method successfully enabled the formation of compact and transparent amorphous TiO2 layers with a high deposition rate of 1.2 μm per minute. The atmospheric pressure method reported here appears to be a promising up-scalable method for the high rate and large scale deposition of amorphous titanium dioxide thin films.",

keywords = "Atmospheric pressure plasma, Thin film, TiO, Titanium ethoxide",

author = "Rodolphe Mauchauff{\'e} and Seongchan Kang and Moon, \{Se Youn\}",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2019",

month = oct,

day = "25",

doi = "10.1016/j.surfcoat.2018.01.088",

language = "English",

volume = "376",

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journal = "Surface and Coatings Technology",

issn = "0257-8972",

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TY - JOUR

T1 - Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air

AU - Mauchauffé, Rodolphe

AU - Kang, Seongchan

AU - Moon, Se Youn

PY - 2019/10/25

Y1 - 2019/10/25

N2 - In this work, the deposition of titanium oxide thin films at atmospheric pressure via an open-air liquid-assisted plasma-enhanced method has been studied. Morphology, chemical composition, crystal structure as well as optical properties of the deposited thin films were investigated. The method successfully enabled the formation of compact and transparent amorphous TiO2 layers with a high deposition rate of 1.2 μm per minute. The atmospheric pressure method reported here appears to be a promising up-scalable method for the high rate and large scale deposition of amorphous titanium dioxide thin films.

AB - In this work, the deposition of titanium oxide thin films at atmospheric pressure via an open-air liquid-assisted plasma-enhanced method has been studied. Morphology, chemical composition, crystal structure as well as optical properties of the deposited thin films were investigated. The method successfully enabled the formation of compact and transparent amorphous TiO2 layers with a high deposition rate of 1.2 μm per minute. The atmospheric pressure method reported here appears to be a promising up-scalable method for the high rate and large scale deposition of amorphous titanium dioxide thin films.

KW - Atmospheric pressure plasma

KW - Thin film

KW - TiO

KW - Titanium ethoxide

UR - https://www.scopus.com/pages/publications/85044534336

U2 - 10.1016/j.surfcoat.2018.01.088

DO - 10.1016/j.surfcoat.2018.01.088

M3 - Journal article

AN - SCOPUS:85044534336

SN - 0257-8972

VL - 376

SP - 84

EP - 89

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Fast formation of amorphous titanium dioxide thin films using a liquid-assisted plasma-enhanced deposition process in open air

Abstract

Keywords

Quacquarelli Symonds(QS) Subject Topics

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