Skip to main navigation Skip to search Skip to main content

Formation of low-resistance and transparent indium tin oxide ohmic contact for high-brightness GaN-based light-emitting diodes using a Sn-Ag interlayer

  • June O. Song
  • , Kyung Kook Kim
  • , Hyunsoo Kim
  • , Yong Hyun Kim
  • , Hyun Gi Hong
  • , Hyeonseok Na
  • , Tae Yeon Seong*
  • *Corresponding author for this work
  • National Institute for Materials Science Tsukuba
  • Samsung
  • Korea University

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report on the formation of low-resistance and highly transparent indium tin oxide (ITO) ohmic contacts to p-GaN using a Sn-Ag alloy interlayer. Although the as-deposited Sn-Ag(6 nm)/ITO(200 nm) contacts show non-ohmic behaviors, the scheme becomes ohmic with specific contact resistance of 4.72×10-4 Ω cm2 and produce transmittance of ∼91% at wavelength of 460 nm when annealed at 530 °C. Blue light-emitting diodes (LEDs) fabricated with the Sn-Ag/ITO contacts give forward-bias voltage of 3.31 V at injection current of 20 mA. LEDs with the Sn-Ag/ITO contacts show the improvement of the output power by 62% (at 20 mA) compared with LEDs with Ni/Au contacts.

Original languageEnglish
Pages (from-to)211-214
Number of pages4
JournalMaterials Science in Semiconductor Processing
Volume10
Issue number4-5
DOIs
StatePublished - 2007.08

Keywords

  • Ag-Sn alloy
  • GaN
  • Indium tin oxide
  • Light-emitting diode
  • Ohmic contact

Fingerprint

Dive into the research topics of 'Formation of low-resistance and transparent indium tin oxide ohmic contact for high-brightness GaN-based light-emitting diodes using a Sn-Ag interlayer'. Together they form a unique fingerprint.

Cite this