Skip to main navigation Skip to search Skip to main content

Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method

  • Jeong O. Lee
  • , C. Park
  • , Ju Jin Kim
  • , Jinhee Kim
  • , Jong Wan Park
  • , Kyung Hwa Yoo
  • Jeonbuk National University
  • Korea Research Institute of Standards and Science

Research output: Contribution to journalJournal articlepeer-review

Abstract

The contact resistance between a carbon nanotube and metal electrodes decreases by several orders of magnitude and becomes long-term stable when the nanotube contacted by Ti-Au electrodes was annealed by a rapid thermal annealing method at 600-800°C for 30 s. The contact resistances of the annealed samples are in the range 0.5-50 kΩ at room temperature, depending on the electrical properties of the nanotube. The short and relatively low-temperature annealing process enables us to make a surface Ti-nanotube contact suitable for electrical measurements. For the samples with relatively low contact resistances (0.5-5 kΩ) at room temperature, the contact resistance remained constant or decreased slightly as the temperature was lowered. Those with a relatively high contact resistance (5-50 kΩ), on the other hand, showed increasing contact resistance with a lowering of the temperature.

Original languageEnglish
Pages (from-to)1953-1956
Number of pages4
JournalJournal of Physics D: Applied Physics
Volume33
Issue number16
DOIs
StatePublished - 2000.08.21

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Physics & Astronomy

Fingerprint

Dive into the research topics of 'Formation of low-resistance ohmic contacts between carbon nanotube and metal electrodes by a rapid thermal annealing method'. Together they form a unique fingerprint.

Cite this