Abstract
We report a facile method to fabricate free-standing polyimide (PI) nanotips on substrates by using plasma treatment with oxygen gas. The PI nanotips were prepared from the self-organization of unetchable materials deposited on a PI film during the plasma treatment. This approach provides a single-step process for the preparation of polymer nanotips in a large area (>inch scale). Furthermore, a selective patterning of the PI nanotips in a specific area was achieved by using a shadow mask. Due to excellent thermal resistance of PI, the PI nanotips maintained structural integrity at high temperature (∼ 300 °C). To demonstrate potential application of PI nanotips as a template for hollow nanostructures, hollow TiO2 nanotips were prepared after atomic layer deposition of TiO2 followed by the burning of PI layer.
| Original language | English |
|---|---|
| Pages (from-to) | 5207-5210 |
| Number of pages | 4 |
| Journal | Journal of nanoscience and nanotechnology |
| Volume | 15 |
| Issue number | 7 |
| DOIs | |
| State | Published - 2015.07.1 |
Keywords
- Hollow tio nanotips
- Plasma-Based etching
- Polymer nanotip
- Selective nano-patterning
Quacquarelli Symonds(QS) Subject Topics
- Materials Science
- Engineering - Chemical
- Chemistry
- Physics & Astronomy
- Biological Sciences
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