Skip to main navigation Skip to search Skip to main content

Gate-tunable quantum dot formation between localized-resonant states in a few-layer MoS2

  • Bum Kyu Kim
  • , Dong Hwan Choi
  • , Byung Sung Yu
  • , Minsoo Kim
  • , Kenji Watanabe
  • , Takashi Taniguchi
  • , Ju Jin Kim
  • , Myung Ho Bae*
  • *Corresponding author for this work
  • Korea Research Institute of Standards and Science
  • Jeonbuk National University
  • University of Manchester
  • National Institute for Materials Science Tsukuba
  • University of Science and Technology UST

Research output: Contribution to journalJournal articlepeer-review

Abstract

We demonstrate a gate-tunable quantum dot (QD) located between two potential barriers defined in a few-layer MoS2. Although both local gates used to tune the potential barriers have disorder-induced QDs, we observe diagonal current stripes in current resonant islands formed by the alignment of the Fermi levels of the electrodes and the energy levels of the disorder-induced QDs, as evidence of the gate-tunable QD. We demonstrate that the charging energy of the designed QD can be tuned in the range of 2-6 meV by changing the local-gate voltages in ∼1 V.

Original languageEnglish
Article number195207
JournalNanotechnology
Volume32
Issue number19
DOIs
StatePublished - 2021.05.7

Keywords

  • Charging energy
  • MoS
  • Quantum dot
  • Tunable potential barrier

Quacquarelli Symonds(QS) Subject Topics

  • Engineering - Mechanical
  • Materials Science
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Engineering - Chemical
  • Chemistry

Fingerprint

Dive into the research topics of 'Gate-tunable quantum dot formation between localized-resonant states in a few-layer MoS2'. Together they form a unique fingerprint.

Cite this