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Ge1-xSnx/Ge heterostructure infrared photodetector

  • Jeonbuk National University
  • Mongolian University of Science and Technology
  • Kunsan National University

Research output: Contribution to conferenceConference paperpeer-review

Abstract

We report the optoelectronic characterization of Ge2-xSnx/Ge heteroj unction infrared (IR) photodetectors fabrication on Si substrate using rapid thermal chemical vapor deposition (RTCVD) with Ge2H6 and SnCl4 precursors and in a CMOS compatible process. We obtained that Sn contents in Ge1-xSnx. Epitaxial layer ∼5.9%. The surface roughness root mean square (RMS) were 1.2 nm. The leakage current of a device as low as 0.7 μ? at 1 V and leakage current reduced as device size decrease. At 1550 nm wavelength, the responsivity of the Ge1-xSnx/Ge devices was estimated to be 54 mA/W was measured for a bias of 2 V, without an optimal antireflection coating. Fabricated device shows practicability for optoelectronic applications in the extended IR wavelength regime.

Original languageEnglish
Title of host publication2015 IEEE SENSORS - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479982028
DOIs
StatePublished - 2015.12.31
Event14th IEEE SENSORS - Busan, Korea, Republic of
Duration: 2015.11.12015.11.4

Publication series

Name2015 IEEE SENSORS - Proceedings

Conference

Conference14th IEEE SENSORS
Country/TerritoryKorea, Republic of
CityBusan
Period15.11.115.11.4

Keywords

  • GeSn
  • heterostructure
  • infrared
  • photodetector
  • RTCVD

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Chemistry
  • Physics & Astronomy

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