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Growth and optical characteristics of Mg-doped GaAs epitaxial layers by molecular beam epitaxy

  • Hyun Young Choi
  • , Min Young Cho
  • , Kwang Gug Yim
  • , Min Su Kim
  • , Dong Yul Lee
  • , Jin Soo Kim
  • , Jong Su Kim
  • , Jae Young Leem*
  • *Corresponding author for this work
  • Inje University
  • Samsung
  • Yeungnam University

Research output: Contribution to journalJournal articlepeer-review

Abstract

Photoluminescence (PL) measurement is used to study the optical properties of Mg-doped GaAs epitaxial layers grown by molecular beam epitaxy (MBE) with various growth temperatures. Four dominant PL peaks are observed, which may be associated with free-to-bound (e-A), exciton-bound to neutral acceptor (A oX), and two kinds of acceptor associated (g, g-g) transitions. The g and g-g peaks are especially prominent in a sample with a carrier concentration of 2.3 × 1017 cm-3. To investigate the behavior of each peak as a function of temperature, PL measurements were carried out over a temperature range of 18-152 K. The AoX peak position follows the Varshni model for GaAs with increasing temperature. For the g and AoX peaks, we observe an increase in PL intensity with increasing temperature from 18 to 28 K. This phenomenon is known as "negative thermal quenching (NTQ)", and it is observed in the g peak for the first time in this paper.

Original languageEnglish
Pages (from-to)6-9
Number of pages4
JournalMicroelectronic Engineering
Volume89
Issue number1
DOIs
StatePublished - 2012.01

Keywords

  • Gallium arsenide
  • Molecular beam epitaxy
  • Negative thermal quenching
  • Photoluminescences

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Physics & Astronomy

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