Growth of GaN nano-column on Si (111) substrate using Au+Ga alloy seeding by pulsed flow method using MOCVD

  • Jae Chul Song*
  • , Dong Hun Kang
  • , Seon Ho Lee
  • , Eun Su Jang
  • , Dong Wook Kim
  • , Santhakumar Kannappan
  • , Cheul Ro Lee
  • *Corresponding author for this work

Research output: Contribution to conferenceConference paperpeer-review

Abstract

Vertical GaN nano-columns arrays were grown on Au-coated silicon (111) substrate by Au+Ga alloy seeding method and pulsed flow of Gallium and ammonia using metalorganic chemical vapor deposition (MOCVD). A gold thin film was deposited on Si using an ion coating system. The Au coated Si substrate was annealed at 800°C under hydrogen ambient for 5 min. The pre-deposition of gallium and nitrogen was performed for 60 sec to form Au+Ga and nitrogen solid solution, which acts as the initial nucleation islands. Then Gallium and ammonia were let in pulse method. Scanning electron microscopy (SEM) image reveals a vertical growth and cylindrical in shape GaN nano-column. From the sharp PL peak intensity it is clearly seen that the dislocation density is reduced considerably and the optical quality of the nano-column is improved.

Original languageEnglish
Title of host publicationSemiconductor Photonics
Subtitle of host publicationNano-Structured Materials and Devices
PublisherTrans Tech Publications
Pages108-110
Number of pages3
ISBN (Print)0878494715, 9780878494712
DOIs
StatePublished - 2008
EventInternational Conference on Materials for Advanced Technologies, ICMAT 2007 - , Singapore
Duration: 2007.07.12007.07.6

Publication series

NameAdvanced Materials Research
Volume31
ISSN (Print)1022-6680

Conference

ConferenceInternational Conference on Materials for Advanced Technologies, ICMAT 2007
Country/TerritorySingapore
Period07.07.107.07.6

Keywords

  • Au coating
  • GaN
  • MOCVD
  • Nanocolumn
  • Pulse flow
  • Silicon substrate

Quacquarelli Symonds(QS) Subject Topics

  • Engineering & Technology

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