High-energy-electron-beam induced oxidation of an aluminum film

Kyoung Jae Lee; Sukmin Chung; Kyuwook Ihm; Tai Hee Kang; Yong Woon Choi; Young Hwan Han; Ki Ho Yang; Byung Cheol Lee

doi:10.3938/jkps.58.109

High-energy-electron-beam induced oxidation of an aluminum film

Kyoung Jae Lee
, Sukmin Chung
, Kyuwook Ihm^*
, Tai Hee Kang
, Yong Woon Choi
, Young Hwan Han
, Ki Ho Yang
, Byung Cheol Lee

^*Corresponding author for this work

Department of Physics

Pohang University of Science and Technology
Pohang Accelerator Laboratory
Korea Atomic Energy Research Institute

Research output: Contribution to journal › Journal article › peer-review

Abstract

The surface properties of Al thin films (500 Å) modified by irradiation with high-energy electron beams (0.3, 1, or 2 MeV with a flux of 7 × 10⁸ electrons·cm^-2·s^-1) have been investigated using synchrotron-radiation photoelectron emission spectroscopy. No morphological changes were observed, but increased oxidation of the Al films was observed when they were irradiated for longer than 40 min. Selective oxidation of the irradiated regions of the Al films was achieved using shadow masking. A scanning photoemission electron microscopy image at the O l s core level clearly showed spatially resolved oxidation contrast in the Al layer.

Original language	English
Pages (from-to)	109-111
Number of pages	3
Journal	Journal of the Korean Physical Society
Volume	58
Issue number	1
DOIs	https://doi.org/10.3938/jkps.58.109
State	Published - 2011.01.14

Keywords

E-beam
Oxidation of aluminum
X-ray spectroscopy

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10.3938/jkps.58.109

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title = "High-energy-electron-beam induced oxidation of an aluminum film",

abstract = "The surface properties of Al thin films (500 {\AA}) modified by irradiation with high-energy electron beams (0.3, 1, or 2 MeV with a flux of 7 × 108 electrons·cm-2·s-1) have been investigated using synchrotron-radiation photoelectron emission spectroscopy. No morphological changes were observed, but increased oxidation of the Al films was observed when they were irradiated for longer than 40 min. Selective oxidation of the irradiated regions of the Al films was achieved using shadow masking. A scanning photoemission electron microscopy image at the O l s core level clearly showed spatially resolved oxidation contrast in the Al layer.",

keywords = "E-beam, Oxidation of aluminum, X-ray spectroscopy",

author = "Lee, \{Kyoung Jae\} and Sukmin Chung and Kyuwook Ihm and Kang, \{Tai Hee\} and Choi, \{Yong Woon\} and Han, \{Young Hwan\} and Yang, \{Ki Ho\} and Lee, \{Byung Cheol\}",

year = "2011",

month = jan,

day = "14",

doi = "10.3938/jkps.58.109",

language = "English",

volume = "58",

pages = "109--111",

journal = "Journal of the Korean Physical Society",

issn = "0374-4884",

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TY - JOUR

T1 - High-energy-electron-beam induced oxidation of an aluminum film

AU - Lee, Kyoung Jae

AU - Chung, Sukmin

AU - Ihm, Kyuwook

AU - Kang, Tai Hee

AU - Choi, Yong Woon

AU - Han, Young Hwan

AU - Yang, Ki Ho

AU - Lee, Byung Cheol

PY - 2011/1/14

Y1 - 2011/1/14

N2 - The surface properties of Al thin films (500 Å) modified by irradiation with high-energy electron beams (0.3, 1, or 2 MeV with a flux of 7 × 108 electrons·cm-2·s-1) have been investigated using synchrotron-radiation photoelectron emission spectroscopy. No morphological changes were observed, but increased oxidation of the Al films was observed when they were irradiated for longer than 40 min. Selective oxidation of the irradiated regions of the Al films was achieved using shadow masking. A scanning photoemission electron microscopy image at the O l s core level clearly showed spatially resolved oxidation contrast in the Al layer.

AB - The surface properties of Al thin films (500 Å) modified by irradiation with high-energy electron beams (0.3, 1, or 2 MeV with a flux of 7 × 108 electrons·cm-2·s-1) have been investigated using synchrotron-radiation photoelectron emission spectroscopy. No morphological changes were observed, but increased oxidation of the Al films was observed when they were irradiated for longer than 40 min. Selective oxidation of the irradiated regions of the Al films was achieved using shadow masking. A scanning photoemission electron microscopy image at the O l s core level clearly showed spatially resolved oxidation contrast in the Al layer.

KW - E-beam

KW - Oxidation of aluminum

KW - X-ray spectroscopy

UR - https://www.scopus.com/pages/publications/78751517440

U2 - 10.3938/jkps.58.109

DO - 10.3938/jkps.58.109

M3 - Journal article

AN - SCOPUS:78751517440

SN - 0374-4884

VL - 58

SP - 109

EP - 111

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 1

ER -

High-energy-electron-beam induced oxidation of an aluminum film

Abstract

Keywords

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