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Hole-induced ferromagnetic properties of Fe-added ZnO films

  • S. Y. Seo
  • , C. H. Kwak
  • , Y. B. Lee
  • , S. H. Kim
  • , S. H. Park
  • , S. H. Han*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We investigated the structural and the magnetic properties of dilute magnetic semiconductor Zn0.96Fe0.04O films by using X-ray diffraction (XRD) and SQUID magnetization measurements. The films were synthesized on α-Al2O3 (0001) substrates by using a RF magnetron sputtering system with RF-powers of 40, 60 and 80 W. The XRD measurements revealed that the films had a wurtzite structure with their crystal (0001) directions oriented along the c-axis of the substrate. The best crystal quality was obtained at an RF-powder of 60 W. The SQUID magnetization measurements demonstrated that the films synthesized at 60 W were ferromagnetic at 10 K. An X-ray photoemission spectroscopy (XPS) analysis revealed an Fe chemical valence state of 2+ and energy dispersive spectroscopy measurements showed the presence of extra oxygen in the films. Our observations strongly suggest that Fe2+ ions are exactly substituted at the Zn2+ sites of the ZnO films and that the extra oxygen mediates the ferromagnetic properties of the films.

Original languageEnglish
Pages (from-to)249-252
Number of pages4
JournalJournal of the Korean Physical Society
Volume53
Issue number1
DOIs
StatePublished - 2008.07

Keywords

  • DMS
  • Ferromagnetic
  • Film
  • Sputtering
  • ZnFeO

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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