Identification of F impurities in F-doped ZnO by synchrotron X-ray absorption near edge structures

  • Sutassana Na-Phattalung
  • , Sukit Limpijumnong
  • , Chul Hee Min
  • , Deok Yong Cho
  • , Seung Ran Lee
  • , Kookrin Char
  • , Jaejun Yu

Research output: Contribution to journalJournal articlepeer-review

Abstract

Synchrotron X-ray absorption near edge structure (XANES) measurements of F K-edge in conjunction with first-principles calculations are used to identify the local structure of the fluorine (F) atom in F-doped ZnO. The ZnO film was grown by pulsed laser deposition with an Nd:YAG laser, and an oxyfluoridation method was used to introduce F ions into the ZnO films. The measured XANES spectrum of the sample was compared against the first-principles XANES calculations based on various models for local atomic structures surrounding F atoms. The observed spectral features are attributed to ZnF2 and FO defects in wurtzite bulk ZnO.

Original languageEnglish
Article number161528
JournalJournal of Applied Physics
Volume123
Issue number16
DOIs
StatePublished - 2018.04.28

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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