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Improved Interfacial Charge Transfer Dynamics and Onset Shift in Nanostructured Hematite Photoanodes via Efficient Ti 4+ /Sn 4+ Heterogeneous Self-Doping Through Controlled TiO 2 Underlayers

  • Jin Woo Park
  • , Mahadeo A. Mahadik*
  • , Haiqing Ma
  • , Gil Woo An
  • , Hyun Hwi Lee
  • , Sun Hee Choi
  • , Weon Sik Chae
  • , Hee Suk Chung
  • , Jum Suk Jang
  • *Corresponding author for this work
  • Jeonbuk National University
  • Pohang University of Science and Technology
  • Korea Basic Science Institute

Research output: Contribution to journalJournal articlepeer-review

Abstract

We introduce a simple strategy to unintentional heterogeneous Ti 4+ /Sn 4+ doping and surface passivation of hematite via TiO 2 underlayers at high temperature quenching. The effects of the controlled TiO 2 underlayer thickness and high temperature quenching process on the interfacial diffusion of Ti 4+ /Sn 4+ and TiO 2 passivation of hematite nanorod arrays have been carefully studied. The improved photoelectrochemical water oxidation performance of the TiO 2 underlayered hematite nanorod photoanodes after high-temperature quenching (800 °C for 10 min) suggests enhanced interfacial Ti 4+ diffusion, blocking of electron back transfer, and reduced interfacial charge recombination. The TiO 2 underlayers led to more inclined growth of hematite (α-Fe 2 O 3 ) nanorods on the fluorine-doped tin oxide (FTO) substrates. Ti 4+ and Sn 4+ diffusion and formation of the TiO 2 passivation layer on the α-Fe 2 O 3 surface are confirmed by HRTEM and X-ray photoelectron spectroscopy (XPS) analyses. As a result, the TU2 photoanode displayed higher donor density and enhanced photocurrent density of (1.45 mA·cm -2 ) than the pristine hematite photoelectrode (1.0 mA·cm -2 ). The improved photoelectrochemical performance of TU2 is attributed to the high separation efficiency of photoinduced carriers via TiO 2 underlayer, the Ti 4+ /Sn 4+ diffusion, and surface passivation of hematite at high-temperature annealing. The thickness of the TiO 2 underlayer has great influence on the surface passivation as well as resistance on FTO/hematite interfaces than the diffused Sn.

Original languageEnglish
Pages (from-to)6947-6958
Number of pages12
JournalACS Sustainable Chemistry and Engineering
Volume7
Issue number7
DOIs
StatePublished - 2019.04.1

Keywords

  • FTO deformation
  • Hematite; Ti /Sn diffusion
  • Onset potential
  • Surface passivation
  • TiO underlayer

Quacquarelli Symonds(QS) Subject Topics

  • Environmental Sciences
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Engineering - Chemical
  • Chemistry

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