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Improved technique for extraction of effective mobility by considering gate bias-dependent inversion charges in a floating-body Si/SiGe pMOSFET

  • Hagyoul Bae
  • , Tewook Bang
  • , Choong Ki Kim
  • , Jae Hur
  • , Seyeob Kim
  • , Chang Hoon Jeon
  • , Jun Young Park
  • , Dae Chul Ahn
  • , Gun Hee Kim
  • , Yunik Son
  • , Jae Hoon Lee
  • , Yong Taik Kim
  • , Seong Wan Ryu
  • , Yang Kyu Choi*
  • *Corresponding author for this work
  • Korea Advanced Institute of Science and Technology
  • SK Corporation

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report an accurate extraction technique of effective mobility (μeff) by considering gate-bias (VGS)-dependent effective inversion charges (Qinv, eff) as a normalized correction factor (σVGS)) when using the gate-to-source/drain capacitance-voltage (C-V) measurement in a p-channel Si/SiGe MOSFET with a floating body structure. In the proposed technique, two different capacitance-voltage configurations: a gate-to-source/drain (CG-SD) configuration without body contact and a gateto-source/drain/body (CG-SDB) configuration with body contact are utilized for the accurate extraction of μeff.

Original languageEnglish
Pages (from-to)3247-3250
Number of pages4
JournalJournal of nanoscience and nanotechnology
Volume17
Issue number5
DOIs
StatePublished - 2017

Keywords

  • Effective Inversion Channel
  • Effective Mobility
  • Empirical Modeling
  • SiGe MOSFET
  • Split C-V Method

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