@inproceedings{828bdd6ef71c4e9cad47e89174d9bf1e,
title = "In-situ fabrication of \{111\} mirror and optical bench using double-sided anisotropic wet etching of \{100\} silicon wafer",
abstract = "This work presents a novel fabrication method for \{111\} dual mirror and optical bench using double-sided anisotropic wet etching of 100> oriented silicon wafer. The roughness of the wet etched \{111\} plane is 8 nm.",
keywords = "100> oriented silicon, double-sided anisotropic wet etching, optical bench, \{111\} mirror",
author = "Kim, \{Jung Mu\} and Hyunseok Kim and Sunghyun Yoo and Lee, \{Kook Nyung\} and Kim, \{Yong Kweon\}",
year = "2012",
doi = "10.1109/OMEMS.2012.6318834",
language = "English",
isbn = "9781457715112",
series = "International Conference on Optical MEMS and Nanophotonics",
pages = "125--126",
booktitle = "2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012",
note = "2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012 ; Conference date: 06-08-2012 Through 09-08-2012",
}