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Light output enhancement of GaN-based flip-chip light-emitting diodes fabricated with SiO2 / TiO2 distributed Bragg reflector coated on mesa sidewall

  • K. H. Baik
  • , B. K. Min
  • , J. Y. Kim
  • , H. K. Kim
  • , C. Sone
  • , Y. Park
  • , H. Kim
  • Korea Electronics Technology Institute
  • Samsung

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report on the enhanced light output of GaN-based flip-chip light-emitting diodes (LEDs) fabricated with SiO2 / TiO2 distributed Bragg reflector (DBR) on mesa sidewall. At the wavelength of 400 nm, five pairs of SiO2 / TiO2 DBR coats on the GaN layer showed a normal-incidence reflectivity as high as 99.1%, along with an excellent angle-dependent reflectivity. As compared to the reference LED, the LED fabricated with the DBR-coated mesa sidewall showed an increased output power by a factor of 1.32 and 1.12 before and after lamp packaging, respectively. This could be attributed to an efficient reflection of the laterally guided mode at the highly reflective mesa sidewall, enhancing the subsequent extraction of light through the sapphire substrate.

Original languageEnglish
Article number063105
JournalJournal of Applied Physics
Volume108
Issue number6
DOIs
StatePublished - 2010.09.15

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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