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Lonsdaleite Diamond Growth on Reconstructed Si (100) by Hot-Filament Chemical Vapor Deposition (HFCVD)

  • Chu Van Chiem
  • , Hyung Kee Seo
  • , Shafeeque G. Ansari
  • , Gil Sung Kim
  • , Jae Myung Seo
  • , Hyung Shik Shin*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

In this paper, the growth of Lonsdaleite diamond using hot-filament chemical vapor deposition (HFCVD) on flashed and reconstructed Si (100) is reported. Surface morphology studies using scanning electron microscopy (SEM) show that the film is composed of decahedron and icosahedron diamond particles. The X-ray diffraction (XRD) pattern has a strongest peak at 47° and a peak at 41°, which is indicative of Lonsdaleite nature of the grown diamond film. The Raman spectrum of the film shows a broadened diamond peak at wave number of 1,329 cm-1, which has shifted towards the peak position corresponding to Lonsdaleite nature of the diamond (1,326 cm-1).

Original languageEnglish
Pages (from-to)1154-1157
Number of pages4
JournalKorean Journal of Chemical Engineering
Volume20
Issue number6
DOIs
StatePublished - 2003.11

Keywords

  • Diamond
  • HFCVD
  • Lonsdaleite
  • Surface Reconstruction

Quacquarelli Symonds(QS) Subject Topics

  • Engineering - Chemical
  • Chemistry

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