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Low dielectric nanoporous poly(methylsilsesquioxane) (PMSSQ) films via inorganic/organic hybrids

  • Dong Jun Lee*
  • , Kwang Hun Kim
  • , Sung Kyu Min
  • , Byoung Suhk Kim
  • , Hee Woo Rhee
  • , Moon Young Jin
  • , Jin Kyu Lee
  • , Do Yeung Yoon
  • , Kook Heon Char
  • *Corresponding author for this work
  • Sogang University
  • Korea Research Institute of Chemical Technology
  • Seoul National University

Research output: Contribution to journalJournal articlepeer-review

Abstract

Two types of methylsilsesquioxanes (MSSQ) were used as base matrix materials for nanoporous films. The hydrophilicity of MSSQ was controlled by copolymerization for the improved miscibility between MSSQs and star-shaped poly(caprolactone) (PCL) as a porogen. Linear relationship holds between porosity/refractive index and vol% of porogen upto 30%. Dielectric constant of porous MSSQ film could be reduced to 2.2 at the porosity of 30 vol%. Dielectric constant was very sensitive to the content of hydroxyl group of MSSQ and the the latter was reduced by treating surface silanols with hexamethyldisilazane.

Original languageEnglish
Pages (from-to)119-122
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume371
DOIs
StatePublished - 2001

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • Copolymeriation
  • Dehydroxylation
  • Dielectric constant
  • Methylsilsesquioxane (MSSQ)
  • Nanoporosity
  • Thin film

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