Manipulation on the optical properties of InGaN/GaN light emitting diodes by adopting InN layer

  • Jeongwoo Hwang
  • , Kwanjae Lee
  • , Jin Soo Kim*
  • , Cheul Ro Lee
  • , In Hwan Lee
  • , Kwangjae Lee
  • , Jin Hong Lee
  • , Jae Young Leem
  • , Jong Su Kim*
  • , Jae Hyun Ryou
  • , Russell D. Dupuis
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report the influence of an InN layer inserted between InGaN and GaN on the optical properties of InGaN/GaN light emitting diode (LED). The emission wavelength of the InGaN/GaN LED with the InN layer was 459 nm at 10 K, which was red-shifted by 6 nm from that of the LED without the insertion layer (reference LED). The peak position of the reference LED subjected to thermal treatment at 825°C was blue-shifted by 3.5 nm compared to that of the as-grown sample due to the structural variation of indium (In)-related features in InGaN/GaN quantum wells (QWs) and inter-diffusion of In and gallium (Ga) at the interface. However, the emission peak for the InGaN/GaN LED with the InN layer was red-shifted with increasing annealing temperatures. This result can be explained by the additional introduction of In to InGaN/GaN QWs and the reduction in the probability for Ga atoms at the GaN barrier to diffuse into InGaN through the InN layer.

Original languageEnglish
Pages (from-to)109-113
Number of pages5
JournalJournal of Crystal Growth
Volume370
DOIs
StatePublished - 2013.05.1

Keywords

  • A1. Red-shift
  • A1. Thermal treatment
  • B1. InGaN/GaN LED
  • B1. InN

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Chemistry
  • Physics & Astronomy

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