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Memory characteristics of a self-assembled monolayer of Pt nanoparticles as a charge trapping layer

  • Hyejung Choi*
  • , Byung Sang Choi
  • , Tae Wook Kim
  • , Seung Jae Jung
  • , Man Chang
  • , Takhee Lee
  • , Hyunsang Hwang
  • *Corresponding author for this work
  • Gwangju Institute of Science and Technology
  • Chosun University

Research output: Contribution to journalJournal articlepeer-review

Abstract

A self-assembled monolayer of Pt nanoparticles (NPs) was studied as a charge trapping layer for non-volatile memory (NVM) applications. Pt NPs with a narrow size distribution (diameter ∼4 nm) were synthesized via an alcohol reduction method. The monolayer of these Pt NPs was immobilized on a SiO 2 substrate using poly(4-vinylpyridine) (P4VP) as a surface modifier. A metal-oxide-semiconductor (MOS) type memory device with Pt NPs exhibits a relatively large memory window of 5.8 V under ± 7 V for program/erase voltage. These results indicate that the self-assembled Pt NPs can be utilized for NVM devices.

Original languageEnglish
Article number305704
JournalNanotechnology
Volume19
Issue number30
DOIs
StatePublished - 2008.07.30

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